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Effect of surface treatments on the electronic properties of ultra-nanocrystalline diamond films

机译:表面处理对超纳米晶金刚石薄膜电子性能的影响

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We present the soft x-ray spectroscopic study of the ultra-nanocrystalline diamond (UNCD) films with different surface treatments. The samples were prepared by means of microwave plasma enhanced chemical vapor deposition (MPEC VD) and the different surface treatments are applied to alter their field emission properties. The electronic properties were subsequently examined by the soft x-ray absorption and x-ray emission spectroscopy at carbon 1s threshold. From the experimental results, there is no significant variation in electronic structure of oxygen- and hydrogen-plasma treated UNCD films. On the other hand, the biased treated UNCD film shows more remarkable change on the sp~2 and sp~3 states. The formation of sp~2 bonding and the reduction of sp~3 bonding are the consequence of the improved electron field emission properties.
机译:我们介绍了具有不同表面处理的超纳米晶金刚石(UNCD)膜的软X射线光谱研究。通过微波等离子体增强化学气相沉积(MPEC VD)制备样品,并应用不同的表面处理以改变其场发射特性。随后通过在碳1s阈值下的软X射线吸收和X射线发射光谱检查电子性能。从实验结果来看,经氧和氢等离子体处理的UNCD薄膜的电子结构没有明显变化。另一方面,经过偏压处理的UNCD膜在sp〜2和sp〜3状态上显示出更显着的变化。 sp〜2键的形成和sp〜3键的减少是改善的电子场发射特性的结果。

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