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Yttria-stabilized zirconia films of different composition as buffer layers for the deposition of epitaxial diamond/Ir layers on Si(001)

机译:不同组成的氧化钇稳定的氧化锆膜作为缓冲层,用于在Si(001)上沉积外延金刚石/铱层

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摘要

Diamond/iridium/yttria-stabilized-zirconia (YSZ)/silicon is a promising multilayer structure for the future realization of single crystal diamond wafers. In the present work we studied the heteroepitaxial growth of YSZ films on Si(001) prepared by pulsed laser deposition. Films deposited from three ablation targets with different yttrium content were compared systematically. Depending on the specific target purely c-axis oriented tetragonal or cubic films were obtained. The films were epitaxial with a low mosaicity of about 1°. Indium layers deposited on top by e-beam evaporation showed a perfect cube-on-cube epitaxial alignment on all types of YSZ films. The iridium films exhibit a smooth surface with only few holes. All the multilayer structures were stable in subsequent diamond nucleation processes via bias enhanced nucleation (BEN).
机译:金刚石/铱/氧化钇稳定的氧化锆(YSZ)/硅是一种有前景的多层结构,可用于将来实现单晶金刚石晶片。在本工作中,我们研究了通过脉冲激光沉积在Si(001)上YSZ膜的异质外延生长。系统比较了三种不同钇含量的烧蚀靶沉积的薄膜。根据特定目标,获得纯c轴取向的四方或立方膜。这些膜是外延的,具有约1°的低镶嵌性。通过电子束蒸发沉积在顶部的铟层在所有类型的YSZ膜上均显示出完美的立方对立方外延排列。铱膜的表面光滑,只有很少的孔。通过偏置增强成核(BEN),所有多层结构在随后的金刚石成核过程中都是稳定的。

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