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n-type conductivity of phosphorus-doped homoepitaxial single crystal diamond on (001) substrate

机译:(001)衬底上掺磷的同质外延单晶金刚石的n型电导率

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摘要

The macroscopic surface morphology and crystallinity of (001) n-type diamond films, which have been quite recently achieved by P-doping using plasma-enhanced chemical vapor deposition technique, were studied. The observation of diffraction spots, streaks, and Kikuchi patterns in reflection high energy electron diffraction analysis indicated that the surface smoothness and the crystallinity were fine. Regarding the electrical properties of (001) n-type diamond films, Hall-effect measurements over a wide temperature range from 260 to 1000 K were investigated. The conduction band transport without the effect of hopping transport was confirmed within this experimental temperature range.
机译:研究了(001)n型金刚石薄膜的宏观表面形貌和结晶度,最近已通过使用等离子增强化学气相沉积技术进行P掺杂实现了这一目标。在反射高能电子衍射分析中观察到衍射点,条纹和菊池图案表明表面光滑度和结晶度良好。关于(001)n型金刚石膜的电性能,研究了在260至1000 K的宽温度范围内的霍尔效应测量。在此实验温度范围内,证实了没有跳跃传输影响的导带传输。

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