Study of plasma efficiency as a function of arc current in filtered cathodic vacuum arc systems

摘要

Filtered cathodic vacuum arc technology has proven to be an effective method to produce high quality hard coatings. The magnetic filter deployed in this technology is mainly to guide the ionized plasma as well as to prevent the macro-particles reaching the substrates. A filter with high plasma transmission efficiency is essential for a high deposition rate, which is the key to commercialization of the technology. Hence, an investigation has been carried out to study the plasma efficiency of the system under different arc current conditions, which is discussed in this paper. The plasma efficiency tests were carried out on different off-plane double bend (OPDB) filtering systems operated under d.c. or pulse arc current.