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Carbide contacts on homoepitaxial diamond films

机译:同质外延金刚石薄膜上的碳化物接触

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We present experimental investigations of the structural and electrical properties of carbide contacts on homo-epitaxial p-type diamond films in order to achieve Schottky diodes working at high temperatures with highly adhesive ohmic and Schottkycontacts on diamond. For ohmic contacts, the reaction of molybdenum deposited by magnetron sputtering on homo-epitaxial diamond layer is studied through X-ray diffraction and Rutherford backscattering. The formation of hexagonalα-Mo{sub}2C begins at700250L? However, the residual oxygen is exo-diffused only at 900℃ and for undoped diamond. Nevertheless, ohmic contacts are achieved after annealing at 900℃, with a low contact resistivity at a boron concentration of 1.6× 10{sup}21 cm{sup}-3. ForSchottky contacts the in-situ reaction under ultra-high vacuum between Er and a non-oxidized diamond surface begins at 700℃. A potential barrier height of 1.9 eV and a rectification ratio larger than 10{sup}3 at 4 V at least up to 500℃ are obtained. ineach case, coating layers intended to protect carbides against oxidation are assessed.
机译:我们目前对同质外延p型金刚石薄膜上碳化物触点的结构和电性能进行实验研究,以实现肖特基二极管在高温下在金刚石上具有高粘附性的欧姆和肖特基触点。对于欧姆接触,通过X射线衍射和卢瑟福反向散射研究了磁控溅射在同质外延金刚石层上沉积的钼的反应。六角形α-Mo{sub} 2C的形成始于700250L?但是,残留的氧气仅在900℃和未掺杂的金刚石中才向外扩散。然而,在900℃退火后仍可实现欧姆接触,在硼浓度为1.6×10 {sup} 21 cm {sup} -3时,接触电阻率较低。 ForSchottky在超高真空下与Er之间发生原位反应,并且未氧化的金刚石表面始于700℃。在至少500℃以下的温度下,在4V下获得1.9eV的势垒高度和大于10 {sup} 3的整流比。在每种情况下,都要评估旨在保护碳化物免于氧化的涂层。

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