Synthesis and properties of BN:C films deposited by a dual-ion beam sputtering method

摘要

Boron nitride films with carbon added (BN:C) were deposited on Si(100) substrates by a dual-ion beam sputtering deposition method. The BN:C films were analyzed by electron spectroscopy for chemical analysis and a Fourier transform infrared spectroscopy. In addition, a nano-indentation method was used to measure the hardness of the films. Internal stress was estimated by the bending-beam method. With an increase in the C content, the content of the cubic phase in BN:C films was reduced, and the structure of films changed from a cubic phase to a hexagonal phase at more than 13.1 at. percent content of the carbon, while the compressive stress of 5.8 GPa and the hardness value of 60 GPa were reduced to 2 GPa and 10 GPa, respectively. Furthermore, the friction coefficient of the films was estimated in dry air, and the BN film with a content of 7.7 at. percent carbon showed a lower value of 0.14 compared with 0.17 of the pure-cBN film.