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Structural, mechanical and tribological properties of diamond-like carbon films prepared under different substrate bias voltage

机译:在不同衬底偏压下制备的类金刚石碳膜的结构,力学和摩擦学性能

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摘要

Diamond-like carbon (DLC) films were deposited on Si wafer by a plasma CVD system in different substrate bias voltage. The influence of bias voltage on structural, mechanical and tribological properties of the DLC films was investigated. The friction and wear properties of the DLC films in different environments (N_2, vacuum, O_2, dry-air and high moist air) were measured, respectively. As the substrate bias voltage increased from-1 to -3 kV, the sp~3 C and H concentrations of the DLC films decreased, the hardness and internal stress decreased, and the critical load increased. For the tribological properties of the DLC films, the friction coefficient of the films was not affected significantly in the inert environments (N_2 or vacuum), but decreased slightly in the reactive environments (O_2 or high moist air) when increased the substrate bias voltage. However, the wear resistance of the DLC films decreased obviously in different environments when increased the substrate bias. The correlation between the structure, mechanical and tribological properties of the DLC films was presented.
机译:通过等离子体CVD系统在不同的衬底偏置电压下将类金刚石碳(DLC)膜沉积在Si晶片上。研究了偏置电压对DLC膜的结构,机械和摩擦学性能的影响。分别测量了DLC薄膜在不同环境(N_2,真空,O_2,干燥空气和高湿空气)下的摩擦性能和磨损性能。随着衬底偏压从-1 kV增加到-3 kV,DLC薄膜的sp〜3 C和H浓度降低,硬度和内应力降低,临界载荷增加。对于DLC薄膜的摩擦学特性,在惰性环境(N_2或真空)下,膜的摩擦系数没有受到显着影响,但是在反应性环境(O_2或高湿空气)中,当增加衬底偏置电压时,膜的摩擦系数略有降低。然而,当增加衬底偏压时,在不同环境中DLC膜的耐磨性明显降低。介绍了DLC薄膜的结构,力学性能和摩擦学性能之间的相关性。

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