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Biaxial elastic modulus of very thin diamond-like carbon (DLC) films

机译:非常薄的类金刚石碳(DLC)膜的双轴弹性模量

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The biaxial elastic modulus of very thin diamond-like carbon (DLC) films was measured by the recently suggested free overhang method. The DLC films of thickness ranging from 33 to 1100 nm were deposited on Si wafers by radio frequency plasma-assisted chemical vapor deposition (r.f.-PACVD) or by the filtered vacuum arc (FVA) process. Because the substrate was partially removed to obtain sinusoidal free overhang of the DLC film, this method has an advantage over other methods in that the measured value is not affected by the mechanical properties of the substrate. This advantage is more significant for a very thin film deposited on a substrate with a large difference in mechanical properties. The measured biaxial elastic moduli were reasonable values as can be judged from the plane strain modulus of thick films measured by nanoindentation. The biaxial elastic modulus of the film deposited by r.f.-PACVD was 90+-3 GPa and that of the film deposited by FVA process was 600+-50 GPa. While the biaxial elastic modulus of the film deposited by FVA is independent of the film thickness, the film deposited by r.f.-PACVD exhibited decreased elastic modulus with decreasing film thickness when the film is thinner than 500 nm. Although the reason for the different behavior could not be clarified at the present state, differences in structural evolution during the initial stage of film growth seem to be the reason.
机译:通过最近建议的自由悬垂法测量了非常薄的类金刚石碳(DLC)膜的双轴弹性模量。通过射频等离子体辅助化学气相沉积(r.f.-PACVD)或通过过滤真空电弧(FVA)工艺在硅晶片上沉积厚度范围为33至1100 nm的DLC膜。因为部分地去除了衬底以获得DLC膜的正弦自由悬垂,所以该方法相对于其他方法具有优势,因为测量值不受衬底的机械性能的影响。对于沉积在具有很大机械性能差异的基板上的非常薄的薄膜而言,这一优势更为显着。从通过纳米压痕法测得的厚膜的平面应变模量可以判断,测得的双轴弹性模量是合理的值。通过r.f.-PACVD沉积的膜的双轴弹性模量为90 + -3 GPa,通过FVA工艺沉积的膜的双轴弹性模量为600 + -50 GPa。当通过FVA沉积的膜的双轴弹性模量与膜厚度无关时,当膜小于500nm时,通过r-f.PACVD沉积的膜显示出降低的弹性模量,并且膜厚度减小。尽管目前尚不清楚行为不同的原因,但似乎是薄膜生长初期阶段结构演变的差异。

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