Microstructural and mechanical properties of nanometric-multilayered a-Cn/a-C/.../a-CN coatings deposited by rf-magnetron sputtering and nitrogen ion-beam bombardment

摘要

Nanometric-multilayered structures of a-CN/a-C/.../a-CN were deposited on c-Si wafers by rf-magnetron sputtering from a graphite target (a-C layers) and by a hybrid deposition technique combining the above rf-magnetron sputtering simultaneously with nitrogen ion-beam bombardment (a-CN layers). The deposition system had an adjustable substrate holder, which can be oriented to the graphite target and/or to the nitrogen ion-beam source, depending on the substrate. The films were deposited at room temperature, alternatively using either pure argon or a gas mixture of argon and nitrogen. The microstructure of these amorphous multilayered structures was examined by transmission electron microscopy and Raman spectroscopy. The multilayered structures showed a lower compressive stress than their monolayer components. From pin-on-disk test measurements, the friction coefficient and the resistance to scratch were calculated under air and vacuum conditions.