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Fatigue strength of diamond coating-substrate interface assessed by inclined impact tests at ambient and elevated temperatures

机译:通过在环境温度和高温下的倾斜冲击试验评估金刚石涂层-基底界面的疲劳强度

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The effect of two different treatments of cemented carbide substrates, prior to the deposition of a nanoaystalline diamond (NCD) coating, on the film interface fatigue strength was investigated at ambient and elevated temperatures. The first substrate treatment of the cemented carbide substrate was a selective chemical Co-etching and the second one the deposition of a Cr-adhesive layer. Inclined impact tests at 25 degrees C and 300 degrees C were performed on the NCD coated specimens. The related imprints were evaluated by confocal microscopy measurements and EDX micro-analyses. The thermal residual stresses developed in the film structure at various temperatures were estimated by Finite Element Method (FEM) calculations. A fatigue damage in the NCD coating interface region was induced by the repetitive impacts. After this damage, the compressive residual stresses in the NCD film are released leading to its lifting from the substrate (bulge formation) and subsequent coating failure. The NCD film-substrate interface fatigue behavior is significantly affected by the test temperature. Based on the attained results at diverse substrate treatments, Woehler-like diagrams were developed for monitoring the fatigue failure of NCD coating interface area at 25 degrees C and 300 degrees C. The interfacial fatigue strength worsens as the impact test temperature grows in both examined substrate treatment cases. Moreover, Co-etched substrates compared to coated ones by an adhesive Cr-interlayer possess higher interfacial strength at ambient and elevated temperatures. These phenomena were investigated and related explanations are described in the paper. (C) 2014 Elsevier B.V. All rights reserved.
机译:在环境温度和高温下,研究了两种不同处理的硬质合金基体在沉积纳米晶金刚石(NCD)涂层之前对膜界面疲劳强度的影响。硬质合金衬底的第一个衬底处理是选择性化学共蚀刻,第二个是Cr粘合剂层的沉积。在NCD涂层样品上分别在25摄氏度和300摄氏度下进行了倾斜冲击试验。通过共聚焦显微镜测量和EDX显微分析评估相关的印记。通过有限元方法(FEM)计算来估算在各种温度下薄膜结构中产生的热残余应力。 NCD涂层界面区域的疲劳损伤是由重复冲击引起的。在这种损坏之后,NCD膜中的压缩残余应力被释放,导致其从基材上剥离(隆起)并随后发生涂层故障。 NCD膜-基底界面的疲劳行为受测试温度的影响很大。根据在各种基材处理下获得的结果,开发了类似Woehler的图表,用于监测NCD涂层界面区域在25摄氏度和300摄氏度下的疲劳破坏。随着两个试样的冲击试验温度的升高,界面疲劳强度都会变差治疗案例。此外,与通过粘合剂Cr中间层涂覆的基材相比,经共腐蚀的基材在环境温度和高温下具有更高的界面强度。对这些现象进行了调查,并在本文中描述了相关的解释。 (C)2014 Elsevier B.V.保留所有权利。

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