首页> 外文期刊>Diamond and Related Materials >Fracture behavior of thick diamond films prepared by DC arc plasma jet method
【24h】

Fracture behavior of thick diamond films prepared by DC arc plasma jet method

机译:直流电弧等离子体射流法制备厚金刚石膜的断裂行为

获取原文
获取原文并翻译 | 示例
           

摘要

The ball-on-ring method was used to investigate the fracture behavior of thick diamond film samplesprepared by high-power DC plasma jet CVD method. Both as-grown and polished samples weretested. Great efforts were made to correlate the data obtained to the microstructural features of thetested samples, particularly to the grain size and the pre-existing defects. For as-grown samples, thedata were widely scattered such that it was hard to find any grain size dependence on fracturestrength and toughness. Whilst for polished samples, a linear relationship of fracture strength to theinverse of the square root of the grain size (the well-known Petch-Hall equation) was found to fit thedata reasonably well. This suggests that grain refinement is also an effective way for improving themechanical properties of CVD diamond films. Pre-existing micro-cracks are also an important factoraffecting the mechanical properties of thick CVD diamond films.
机译:圆环法用于研究大功率直流等离子体喷射化学气相沉积法制备的厚金刚石膜样品的断裂行为。生长和抛光的样品都经过测试。做出了巨大的努力,以使获得的数据与被测样品的微观结构特征相关,尤其是与晶粒尺寸和先前存在的缺陷相关。对于生长中的样品,数据分散很大,因此很难找到任何与断裂强度和韧性有关的晶粒尺寸。对于抛光样品,发现断裂强度与晶粒尺寸平方根的倒数成线性关系(众所周知的Petch-Hall方程)可以很好地拟合数据。这表明晶粒细化也是改善CVD金刚石膜的机械性能的有效方法。预先存在的微裂纹也是影响厚CVD金刚石薄膜机械性能的重要因素。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号