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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Study on volatilization rate of silicon in multicrystalline silicon preparation from metallurgical grade silicon
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Study on volatilization rate of silicon in multicrystalline silicon preparation from metallurgical grade silicon

机译:冶金级硅制备多晶硅中硅的挥发速率研究。

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The quantity of silicon lost during evaporation is greater than theoretical expectation during the purification of metallurgical grade silicon by vacuum evaporation. In this paper, silicon volatilization rates were measured for evaporation times of 30, 45 and 60 min at 1723, 1773 and 1823 K, respectively. Results indicate that volatilization rates determined in our experiments are one or two orders of magnitude greater than those from theoretical calculation. The equation for theoretical calculation was revised (ω = (2.23-6.30)× 10~(-1) p_(pa)(M/T)~(1/2)) using silicon evaporation coefficient of 8.5-24. The details of the experimental set-up were found to be important and the mass of silicon evaporated in particular was found to be related to the water-cooling system. The carbon/graphite inserts also and the presence of trace amounts of oxygen in the vacuum furnace could reduce the content of silicon in gaseous phase and support the evaporation of silicon. It was found under certain conditions that there are two principal stages involved: 1) Formation of vapor-liquid equilibrium, 2) Maintenance of the established vapor-liquid equilibrium during the silicon evaporation process. It was found that silicon process losses can be reduced by shortening the time of the first stage.
机译:蒸发过程中损失的硅量大于通过真空蒸发纯化冶金级硅时的理论预期。在本文中,分别在1723、1773和1823 K下测量了30、45和60分钟蒸发时间的硅挥发速率。结果表明,在我们的实验中确定的挥发速率比理论计算的挥发速率高一到两个数量级。使用8.5-24的硅蒸发系数修改了理论计算公式(ω=(2.23-6.30)×10〜(-1)p_(pa)(M / T)〜(1/2))。实验装置的细节很重要,特别是蒸发的硅的质量与水冷却系统有关。碳/石墨插入物以及真空炉中痕量氧气的存在还可以减少气相中硅的含量并支持硅的蒸发。发现在某些条件下涉及两个主要阶段:1)汽-液平衡的形成,2)在硅蒸发过程中维持已建立的汽-液平衡。发现可以通过缩短第一阶段的时间来减少硅工艺损失。

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