首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >The effects of plasma pre-treatment and post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition
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The effects of plasma pre-treatment and post-treatment on diamond-like carbon films synthesized by RF plasma enhanced chemical vapor deposition

机译:等离子体预处理和后处理对RF等离子体增强化学气相沉积合成的类金刚石碳膜的影响

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Diamond-like carbon (DLC) films were synthesized by RF plasma enhanced chemical vapor deposition and the effects of plasma pre-treatment and post-treatment on the DLC films were investigated. Experimental results show that the surface roughness of the substrate, ranging from 0.2 to 1.2 nm, created by the plasma pre-treatment, will affect the surface roughness of the DLC films deposited using methane as the carbon source. However, the film surface roughness (0.1-0.4 nm) is much smaller than that of the substrate. Raman analysis and hardness measurement by nanoindentation indicate that the structure and the hardness of the DLC films are relatively unchanged for the film surface roughness investigated. For the argon or hydrogen plasma post-treatment of the DLC films deposited using acetylene as the carbon source, it is found that surface roughness decreases with the post-treatment time. Although the hardness decreases after post-treatment, it remains relatively constant with increasing post-treatment time. (C) 2008 Elsevier Ltd. All rights reserved.
机译:通过射频等离子体增强化学气相沉积法合成类金刚石碳(DLC)膜,并研究了等离子体预处理和后处理对DLC膜的影响。实验结果表明,通过等离子体预处理产生的基板表面粗糙度范围为0.2到1.2 nm,将影响以甲烷为碳源沉积的DLC膜的表面粗糙度。但是,膜表面粗糙度(0.1-0.4nm)远小于基板的粗糙度。拉曼分析和纳米压痕硬度测量表明,对于所研究的膜表面粗糙度,DLC膜的结构和硬度相对不变。对于使用乙炔作为碳源沉积的DLC膜的氩气或氢等离子体后处理,发现表面粗糙度随后处理时间而降低。尽管在后处理后硬度降低,但是随着后处理时间的增加,硬度保持相对恒定。 (C)2008 Elsevier Ltd.保留所有权利。

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