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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Two-process diffusion of titanium on the (111) tungsten plane by the current fluctuation method In FEM
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Two-process diffusion of titanium on the (111) tungsten plane by the current fluctuation method In FEM

机译:有限元法中电流波动法在(111)钨平面上钛的两步扩散

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摘要

Field emission current noise of titanium adsorbed on the (1 1 1) tungsten crystal face was investigated. Measurements were carried out for coverages ranging from 0.2 to approximately 2 monolayers in the temperature range 300-1500 K. A linear combination of two theoretical functions obtained by Gesley and Swanson for the diffusion model of current fluctuations was fitted to the experimental autocorrelation functions. In such a way two diffusion coefficients and two activation energies for titanium surface diffusion were determined. The theoretical model is applicable to a temperature range of 800-1450 K. The energy of each diffusion process decreases with increasing coverage, from a value of 1.77 eV (the first process) and 1.42 eV (the second process) until the saturation value of about 0.3 eV is reached for both diffusion processes. The first process occurs below the phase transition point of titanium (1156 K) and the second process occurs above it.
机译:研究了吸附在(1 1 1)钨晶面上的钛的场发射电流噪声。在300-1500 K的温度范围内,进行了覆盖范围从0.2到大约2个单层的测量。将Gesley和Swanson针对电流波动扩散模型获得的两个理论函数的线性组合拟合到实验自相关函数。以这种方式,确定了钛表面扩散的两个扩散系数和两个活化能。该理论模型适用于800-1450 K的温度范围。每个扩散过程的能量都随着覆盖率的增加而降低,从1.77 eV(第一个过程)和1.42 eV(第二个过程)的值直至饱和值。两种扩散过程均达到约0.3 eV。第一个过程发生在钛(1156 K)的相变点以下,第二个过程发生在钛的相变点以下。

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