The measurement of high vacuum pressure with hot cathode ionization gauges has basically been known for a long time. This is also true for the problems related to such measurements, as reproducibility, Ion g-term stability and accuracy. Inindustrial measurement technology this results in appreciable expenses for maintenance and calibration of such units in systems, e.g. in semiconductor industry.This new sensor works according to the Bayard-Alpert principle, however in the wide range of 10{sup}-10 to 0.1 mbar. In this way both process and base pressure measurements are possible with one sensor. By the design of the sensor and an integrated EEPROM with individual calibration data, high reproducibility and long-term stability of measurement values is achieved. Process capability is secured by electrical and mechanical shielding means. Thus, also under difficult conditions (discharges, spray water,dust,...) stable and reproducible measurement values are produced.Moreover, the microprocessor is also able to correct the pressure indication for different gas compositions depending on the process involved.
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