Copper and nickel selective recovery by electrowinning from electronic and galvanic industrial solutions

摘要

Laboratory investigations on the kinetics ofcopper and nickel electrowinning from electronic and metalfinishing industries have been carried out as depending voltageat 40℃, using a platinum mesh cathode, an anode of platinumspiral wire and a saturated calomel electrode as reference. Theselective deposition of copper and nickel is possible consideringtheir difference in standard potentials of about 0.6V. The copperdeposition was performed in acid conditions and nickeldeposition in basic conditions.