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首页> 外文期刊>High Temperature Material Processes >PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS
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PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS

机译:纳米结构膜和涂层的等离子体辅助沉积

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摘要

Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.
机译:综述了有关等离子体辅助沉积纳米结构薄膜和涂层的最新工作。正在开发几种方法。这些包括传统的等离子喷涂,其中在喷涂前通过机械研磨在粗饲料粉中诱导出纳米结构;热等离子体喷雾热解;喷射到射频炬中的细粉的等离子闪蒸;高超声速等离子体粒子沉积;低压等离子体合成和纳米粒子沉积以产生薄膜。

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