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Enhancement of field emission properties in La-doped ZnO films prepared by magnetron sputtering

机译:磁控溅射制备的La掺杂ZnO薄膜中场发射特性的增强

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摘要

Field emissions (FE) from La-doped zinc oxide (ZnO) films are both experimentally and theoretically investigated. Owing to the La-doped effect, the FE characteristic of ZnO films is remarkably enhanced compared with an undoped sample, and a startling low turn-on electric field of about 0.4 V/mu m (about 2.5 V/mu m for the undoped ZnO films) is obtained at an emission current density of 1 mu A/cm(2) and the stable current density reaches 1 mA/cm(2) at an applied field of about 2.1 V/mu m. A self-consistent theoretical analysis shows that the novel FE enhancement of the La-doped sample may be originated from its smaller work function. Due to the effect of doping with La, the Fermi energy level lifts, electrons which tunnelling from surface barrier are consumedly enhancing, and then leads to a huge change of field emission current. Interestingly, it suggests a new effective method to improve the FE properties of film materials.
机译:掺杂镧的氧化锌(ZnO)薄膜的场发射(FE)进行了实验和理论研究。归因于La掺杂效应,与未掺杂样品相比,ZnO薄膜的FE特性得到了显着提高,并且惊人的低导通电场约为0.4 V /μm(未掺杂ZnO约为2.5 V /μm)薄膜)是在1μA/ cm(2)的发射电流密度下获得的,并且在约2.1V /μm的施加电场下稳定电流密度达到1mA / cm(2)。自洽的理论分析表明,La掺杂样品的新型有限元增强可能源于其较小的功函数。由于掺杂了La的作用,费米能级升高,从表面势垒隧穿的电子被大量消耗,从而导致场发射电流发生巨大变化。有趣的是,它提出了一种改善薄膜材料有限元性能的新有效方法。

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