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首页> 外文期刊>Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear >Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing
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Role of microstructure on surface and subsurface damage of sintered silicon carbide during grinding and polishing

机译:微观结构在烧结和抛光过程中对烧结碳化硅的表面和亚表面损伤的作用

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摘要

Sintered silicon carbide with different microstructures: equiaxed grain (EQ) and elongated grain (EL), were prepared. The role of microstructure on surface and subsurface damage during grinding and polishing was investigated. At the same time, the correlation between microstructure and material removal mechanism was studied. The surface and subsurface damage were observed by atomic force microscope (AFM) and transmission electron microscopy (TEM). More grain pulling-out was found on the polished surface with EQ than that with EL. The degree of grain pulling-out is related to aspect ratio and grain diameter of individual grains. Lateral cracks appeared in subsurface for silicon carbide samples with EQ during grinding and polishing, while only plastic deformation could be observed with EL during polishing. Material removal mechanism was found to change from brittle fracture to plastic deformation for sintered silicon carbide ceramics with EL as machine procedure moved on from grinding to polishing. The research related surface and subsurface damage to the microstructure of SiC ceramics and will provide valuable insights into the material removal mechanism.
机译:制备了具有不同微结构的烧结碳化硅:等轴晶粒(EQ)和拉长晶粒(EL)。研究了微观结构在研磨和抛光过程中对表面和亚表面损伤的作用。同时,研究了组织与材料去除机理之间的关系。用原子力显微镜(AFM)和透射电子显微镜(TEM)观察表面和亚表面损伤。使用EQ的抛光表面比使用EL的晶粒更多地被拉出。晶粒拉出的程度与单个晶粒的纵横比和晶粒直径有关。在研磨和抛光过程中,带有EQ的碳化硅样品的亚表面出现横向裂纹,而在抛光过程中,仅用EL观察到塑性变形。发现随着机械过程从研磨过渡到抛光,材料去除机理从具有EL的烧结碳化硅陶瓷的脆性断裂变为塑性变形。这项研究与碳化硅陶瓷的表面和亚表面损伤有关,并将为材料去除机理提供有价值的见解。

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