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Wear of aligned silicon nitride under dry sliding conditions

机译:干式滑动条件下取向氮化硅的磨损

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摘要

The wear behaviour of textured silicon nitride (Si{sub}3 N{sub}4) ceramics with aligned microstructures was analyzed under abrasive wear conditions. Dry reciprocating self-mated ball-on-flat wear tests were performed to study the influence of different microstructural plane/orientation combinations on the Si{sub}3N{sub}4 tribological behaviour. Textured materials showed superior wear resistance than non-textured reference Si{sub}3N{sub}4 for the whole range of loads and contact pressures, 5-50 N and 1.7-3.6 GPa, respectively, with an increase of about 70% for the maximum applied load. Within textured materials, the plane perpendicular to the extruding direction exhibited a 50% higher wear resistance (4 × 10{sup}(-5) mm{sup}3 N{sup}(-1) m{sup}(-1)) than the parallel plane where the elongated grains were aligned. The severe wear process involved debonding, fracture and debris formation mechanisms. The progress of this sequence depended on the particular microstructure of each plane/orientation combination. A relationship between abrasive wear resistance and selected microstructural parameters has been established.
机译:在磨料磨损条件下分析了具有对准的微结构的织构氮化硅(Si {sub} 3 N {sub} 4)陶瓷的磨损行为。进行了干式往复自配合式平底球磨损试验,以研究不同的微观结构平面/取向组合对Si {sub} 3N {sub} 4摩擦学行为的影响。在整个载荷和接触压力范围(分别为5-50 N和1.7-3.6 GPa)下,网纹材料显示出比非网纹参考Si {sub} 3N {sub} 4更高的耐磨性,而在5%和50 GPa的接触压力下,网纹材料的耐磨性提高了约70%。最大施加载荷。在纹理材料内,垂直于挤出方向的平面显示出高出50%的耐磨性(4×10 {sup}(-5)mm {sup} 3 N {sup}(-1)m {sup}(-1) ),而不是细长晶粒对齐的平行平面。严重的磨损过程涉及剥离,断裂和碎屑形成机制。该顺序的进行取决于每个平面/方向组合的特定微观结构。已经建立了耐磨性与选定的微结构参数之间的关系。

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