首页> 外文期刊>Carbon: An International Journal Sponsored by the American Carbon Society >Spin-dependent Seebeck effect and huge growth of thermoelectric parameters at band edges in H- and F-doped graphene, free-standing and deposited on 4H-SiC(0001) C-face
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Spin-dependent Seebeck effect and huge growth of thermoelectric parameters at band edges in H- and F-doped graphene, free-standing and deposited on 4H-SiC(0001) C-face

机译:自旋依赖性塞贝克效应以及H和F掺杂石墨烯的能带边缘处的热电参数的巨大增长,自立并沉积在4H-SiC(0001)C面上

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摘要

Graphene halfly doped with H or F possesses local magnetization at the undoped C sites. Thus the Seebeck coefficient is different for each spin channel and its sign also changes depending on the spin polarization. Deposition of doped graphene on the C-face 4H-SiC(0001) with two buffer layers substantially varies the electronic and thermoelectric properties. These properties are efficiently calculated from the semiclassical Boltzmann equations, using the maximally-localized Wannier-functions interpolation of the band structures obtained with the density-functional theory. Our results indicate large growth of the thermopower and the ZT efficiency at the band edges..We show in the model discussion that this phenomenon is more general and applies also to other systems than graphene. It gives prospect for developing new spintronic devices working in the band-edge regime.
机译:半掺杂有H或F的石墨烯在未掺杂的C部位具有局部磁化强度。因此,每个自旋通道的塞贝克系数都不同,并且其符号也根据自旋极化而变化。在具有两个缓冲层的C面4H-SiC(0001)上沉积掺杂的石墨烯会极大地改变电子和热电性能。这些特性可以通过半经典的Boltzmann方程,使用通过密度泛函理论获得的能带结构的最大局部Wannier函数插值来有效地计算。我们的结果表明,热能和带边缘的ZT效率都有很大的增长。我们在模型讨论中表明,这种现象更为普遍,除石墨烯外,还适用于其他系统。它为开发在带边缘状态下工作的新型自旋电子器件提供了前景。

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