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Magnetic properties of carbonitride films elaborated by plasma enhanced chemical vapor deposition~1

机译:等离子体增强化学气相沉积法制得的碳氮化物膜的磁性〜1

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摘要

Several amorphous carbonitride films have been elaborated by plasma enhanced chemical vapor deposition. A redio frefquency discharge has been used under standard conditions with different graphitic nitrogenated compounds. It is shown that the influence of molecular precursor is important concerning in particular the magnetic properties. The films issued from pyrrole and cyanuric chloride exhibit a large number of spins. However, in contrast to previous works ,no cooperative magnetic effects have been found at very low temperature.Finally, it is argued that a further heat-treatment at 1000 deg C of a film, prepared from cyanuric chloride,seems to lead to a crystalline phase of C_3N_4.
机译:通过等离子体增强化学气相沉积已经制备了几种无定形碳氮化物膜。在标准条件下,已使用氧化还原放电和不同的石墨氮化化合物。结果表明,分子前体的影响特别是在磁性方面是重要的。由吡咯和氰尿酰氯发出的薄膜表现出大量的自旋。但是,与以前的工作相反,在非常低的温度下没有发现协同的磁效应。最后,有人认为由氰尿酰氯制备的薄膜在1000摄氏度下进一步热处理似乎会导致结晶。 C_3N_4的相位。

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