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Nanoscale resistive switching memory device composed of NiO nanodot and graphene nanoribbon nanogap electrodes

机译:由NiO纳米点和石墨烯纳米带纳米隙电极组成的纳米级电阻开关存储器件

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摘要

We report a nanoscale resistive random access memory (RRAM) device consisting of a NiO nanodot and graphene nanoribbon (GNR) nanogap electrodes. The GNR nanogap was established by an electroburning process induced by applying voltage ramp stress between the two ends of the GNR. A NiO nanodot was then deposited between the nanogapped GNR electrodes by an elaborately controllable dip pen lithography method using a nickel carbonate [Ni2(CO3)(OH)2] solution. The nanoscale GNR/NiO/GNR RRAM device exhibited reliable unipolar resistive switching characteristics with low SET/RESET voltages and currents, which might be the result of its miniaturized size and well-defined Ohmic contacts between the NiO nanodot and GNR electrodes.
机译:我们报告了由NiO纳米点和石墨烯纳米带(GNR)纳米间隙电极组成的纳米级电阻式随机存取存储器(RRAM)设备。 GNR纳米间隙是通过在GNR的两端之间施加电压斜坡应力而诱发的电灼过程建立的。然后,通过使用碳酸镍[Ni2(CO3)(OH)2]溶液的精细可控的浸笔光刻方法,将NiO纳米点沉积在纳米间隙GNR电极之间。纳米级GNR / NiO / GNR RRAM器件具有可靠的单极性电阻开关特性,具有低的SET / RESET电压和电流,这可能是由于其尺寸小以及NiO纳米点与GNR电极之间明确的欧姆接触所致。

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