PECVD Coatings in Industrial Applications: Recent Advancements in Large Area Linear PECVD Coatings

摘要

The adoption of GPI's Linear PECVDTM process has accelerated over the last year. Several R&D and production reactor modules were installed at major companies and a turnkey in-line system was completed. Through these installations, customers are confirming the superior deposition rate, uniformity and stability of Linear PECVDTM compared to reactive sputtering. Today Linear PECVDTM is being used to deposit oxide and nitride films on a variety of substrates. The films include SiO_2, TiO_2, Al_2O_3, SiN, ZnO, and SnO and the applications include multi-layer AR coatings, single layer oxides and nitrides in combination with sputtered films, thin-film solar coatings, barrier films, anti-smudge coatings and TCO's. This progress demonstrates that GPI's Linear PECVDTM technology may soon displace reactive sputtering of oxides and nitrides for large area substrates in architectural glass, flat panel display and flexible web applications.