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A discrete element model to investigate sub-surface damage due to surface polishing

机译:用于研究由于表面抛光而引起的亚表面损伤的离散元素模型

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摘要

Large high-power laser facilities such as megajoule laser (LMJ) or National Ignition Facility (NIF) are designed to focus about 2 MJ of energy at the wavelength of 351 nm, in the center of an experiment chamber. The final optic assembly of these systems, operating at 351 nm is made of large fused silica optics working in transmission. When submitted to laser at the wavelength of 351 nm, fused silica optics can exhibit damage, induced by the high amount of energy traversing the part. The created damage is a set of micro-chips that appear on the optic surface. Current researches have shown that this damage could be initiated on pre-existing sub-surface damages created during the optics manufacturing process. It is then very important to understand, for various set of manufacturing parameters, what are the key parameters for sub-surface damage. The presented work details the development of a simplified model to investigate the polishing process. Both silica (the material to be polished) and the abrasive particles are modeled using a discrete element approach. This numerical tool allows following the evolution of micro-cracks inside the material during the abrasion process. It is shown how the mechanical properties (pressure), the abrasive properties (shape and quantity of abrasive particles) and the system properties (filtration) have an influence on the sub-surface properties at the end of the process.
机译:大型兆瓦级激光(LMJ)或国家点火设施(NIF)等大功率激光设施设计为在实验室的中心聚焦约2 MJ的能量,波长为351 nm。这些系统的最终光学组件工作在351 nm,由在传输中工作的大型熔融石英光学器件制成。当对波长为351 nm的激光进行照射时,熔融石英光学元件可能会受到损坏,这是由于穿过零件的大量能量引起的。造成的损坏是出现在光学表面上的一组微芯片。当前的研究表明,这种损坏可能是由于光学器件制造过程中预先存在的表面下损坏而引起的。因此,对于各种制造参数来说,了解次表面损伤的关键参数是什么非常重要。提出的工作详细介绍了用于研究抛光过程的简化模型的开发。二氧化硅(待抛光的材料)和磨料颗粒均使用离散元素方法进行建模。这种数值工具可以在磨损过程中跟踪材料内部微裂纹的发展。它显示了机械性能(压力),磨料性能(磨料颗粒的形状和数量)和系统性能(过滤)如何在处理结束时对次表面性能产生影响。

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