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Nanoindentation and nanowear of extremely thin protective layers of C-N and B-C-N

机译:C-N和B-C-N极薄保护层的纳米压痕和纳米磨损

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摘要

Carbon nitride (C-N) and boron and carbon nitride (B-C-N) films, 1 and 3 nm thick, were deposited on magnetic disks by means of a complex treatment method involving plasma irradiation and CN or BCN reactive sputtering in nitrogen and helium mixed gas using two targets of h-BN and graphite. The properties of these extremely thin coatings were evaluated by indentation using an atomic force microscope and nanowear tests using a lateral modulation friction force microscope: The extremely thin B-C-N coatings show highest indentation hardness and good wear resistance properties. It is proposed that this is due to their graduated composition and interfacial properties.
机译:通过一种复杂的处理方法,包括等离子体辐照以及在氮气和氦气混合气体中使用CN或BCN反应性溅射法(使用两种方法)将氮化碳(CN)以及厚度分别为1和3 nm的硼和氮化碳(BCN)膜沉积在磁盘上h-BN和石墨的目标。通过使用原子力显微镜的压痕和使用横向调制摩擦力显微镜的纳米磨损测试,评估了这些极薄涂层的性能:极薄的B-C-N涂层显示出最高的压痕硬度和良好的耐磨性。提出这是由于它们的渐变组成和界面性质。

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