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Effects of La2O3 on electrolytic boronising of titanium

机译:La2O3对钛电解渗硼的影响

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摘要

La2O3 is added into boriding agent considered as a role of boriding catalyst to improve the growth of TiB crystal whiskers in commercial purity titanium (CP-Ti) substrate by electrolytic boronising technology. The catalytic mechanism of boriding catalyst is discussed. The boriding of CP-Ti substrates is carried out in an electrochemical cell in which we use a mixture of sodium tetraborate and potassium carbonate as the base ingredients of molten electrolyte. Both TiB2 and TiB phases in the borided titanium samples are confirmed by X-ray diffraction method (XRD). Scanning electron microscopy (SEM) images reveal the boride layers consist of a homogeneous TiB2 phase on the top and TiB whiskers toward the substrate, and the result verify boriding catalyst promotes the growth of crystal whiskers significantly with an average boride layer thickness of 132 mu m and a maximum thickness 338 mu m.
机译:将La2O3添加到作为硼化催化剂的硼化剂中,以通过电解硼化技术改善商业纯钛(CP-Ti)基板中TiB晶须的生长。讨论了硼化催化剂的催化机理。 CP-Ti基板的硼化是在电化学电池中进行的,在电化学电池中,我们使用四硼酸钠和碳酸钾的混合物作为熔融电解质的基础成分。硼化钛样品中的TiB2和TiB相均通过X射线衍射法(XRD)确认。扫描电子显微镜(SEM)图像显示,硼化物层由顶部均匀的TiB2相和朝向衬底的TiB晶须组成,结果证实硼化催化剂显着促进了晶须的生长,平均硼化物层厚度为132μm最大厚度为338微米。

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