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Boronising of cemented carbides for improved diamond layer adhesion

机译:对硬质合金进行渗硼处理以改善金刚石层的附着力

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摘要

As with a number of other CVD processes, the presence of cobalt has a negative influence on the coating of cemented carbide substrates with CVD diamond films. The cobalt binder phase is therefore usually removed in the near surface region by chemical etching prior to deposition. However the removal of the cobalt binder phase by etching may weaken the near surface region, resulting in a decrease in the performance of the coated cemented carbide tool. An alternative to selective etching of the cobalt binder phase could be the conversion of cobalt into chemically inactive cobalt containing intermetallic phases. The present paper focuses on the formation of intermetallic B-Co phases in the near surface region of pure cobalt substrates and cemented carbide insert tips. One method investigated was coating of substrates with boron by PVD with subsequent tempering. Another method tested was powder pack cementation. Phase analyses were performed by grazing incidence X-ray diffraction. The suitability of pretreatment methods for deposition of diamond films by the hot filament CVD process on cemented carbide insert tips was investigated by WDX linescans and element mappings, SEM, and wear tests. The analyses revealed in all cases the formation of intermetallic B-Co phases after boronising of the substrates. In particular, boronising by a powder pack cementation process led to significantly enhanced wear resistance of the diamond films. It could also be shown that much better adhesion was produced by converting cobalt into intermetalllic B-Co phases than by removing the cobalt binder phase in the near surface region.At the time the work was carried out the author was at the Lehrstuhl fur Theoretische Huttenkunde, Rheinisch- Westfailische Technische Hochschule Aachen, D-52056 Aachen, Germany; he is now with Prym GmbH & Co. KG, Zwefallerstr. 130, D-52224 Stolberg, Germany. Contribution to the 1999 Bodycote International Paper Competition.
机译:与许多其他CVD工艺一样,钴的存在对用CVD金刚石膜涂覆的硬质合金基材的涂层具有负面影响。因此,通常在沉积之前通过化学蚀刻在近表面区域中去除钴粘合剂相。然而,通过蚀刻去除钴粘合剂相可能削弱近表面区域,导致涂覆的硬质合金工具的性能下降。钴粘合剂相的选择性刻蚀的替代方法可以是将钴转化成化学惰性的含金属间相的钴。本文的重点是在纯钴基体和硬质合金刀片尖端的近表面区域中形成金属间B-Co相。研究的一种方法是在随后的回火下通过PVD用硼涂覆基材。测试的另一种方法是粉末包装胶结。通过掠入射X射线衍射进行相分析。通过WDX线扫描仪和元素映射,SEM和磨损测试,研究了通过热丝CVD工艺在硬质合金刀片尖端上沉积金刚石薄膜的预处理方法的适用性。分析表明,在所有情况下,对基材进行硼化处理后都会形成金属间B-Co相。特别地,通过粉末包装胶结工艺进行的硼化导致金刚石膜的耐磨性显着提高。还可以证明,将钴转化为金属间B-Co相所产生的附着力比去除近表面区域中的钴结合相所产生的粘附力要好得多。在进行这项工作时,作者在Lehrstuhl fur Theoretische Huttenkunde ,Rheinisch- Westfailische Technische Hochschule Aachen,D-52056 Aachen,德国;他现在在Zwefallerstr的Prym GmbH&Co. KG工作。 130,D-52224 Stolberg,德国。为1999年Bodycote国际纸质比赛的贡献。

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