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Pulse plasma nitriding for plasma vapour deposition coating of high speed steels

机译:脉冲等离子渗氮,用于高速钢的等离子气相沉积涂层

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摘要

Hard physical vapour deposition (PVD) coatings have extremely desirable properties, tailored to the needs of industrial applications, but sometimes have inadequate frictional properties and frequently fail owing to inadequate support from the steel substrate. Cutting tools are subjected to high subsurface shear stresses and sliding abrasion. Coatings require maximum adhesion onto the substrate and reduced sliding friction and wear coefficients. Optimised pulse plasma nitriding of M2 high speed steel (HSS) prior to PVD processing provides support for the hard coatings and enhances wear resistance. The Eltropuls patented ignition pulse allows stable plasma, minimum heat input, maximum treatable surface, thermal uniformity and minimum energy costs. Pulse plasma nitriding provides optimum surface morphology and composition control within a nitrided case. The inherent high hardness of HSS allows a shallow case to be produced in short nitriding times. Good adhesion is ensured by suppressing compound layer formation. Drilling trials into a 15 mm thick plate of AISI 304 demonstrate that nitriding prior to deposition of TiAlN/VN or C/Cr superlattice PVD coatings significantly increases drill life.
机译:硬质物理气相沉积(PVD)涂层具有非常理想的性能,可以满足工业应用的需要,但有时摩擦性能不足,并且由于钢基材的支撑不足而经常失效。切削工具会承受较高的地下剪切应力和滑动磨损。涂层需要在基材上具有最大的附着力,并需要减小滑动摩擦和磨损系数。在PVD处理之前,对M2高速钢(HSS)进行了优化的脉冲等离子体氮化处理,为硬质涂层提供了支撑,并提高了耐磨性。 Eltropuls获得专利的点火脉冲可实现稳定的等离子体,最小的热量输入,最大的可处理表面,热均匀性和最小的能源成本。脉冲等离子体氮化可在氮化的情况下提供最佳的表面形态和成分控制。 HSS固有的高硬度允许在短氮化时间内生产出浅表壳。通过抑制化合物层的形成确保良好的粘附性。在15毫米厚的AISI 304板上进行的钻孔试验表明,在沉积TiAlN / VN或C / Cr超晶格PVD涂层之前进行氮化处理可以显着延长钻孔寿命。

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