Plasma Source and Method for depositing Thin Film Coatings by Plasma Enhanced Chemical Vapour Deposition

摘要

Innovative sources of advantageous in the technique of plasma Thin Film Coating and Methods for use. More specifically, the present Invention discloses novel linear plasma Sources and plasma produces two-dimensional linear and 2D, respectively, which are useful for Plasma activated Chemical Vapor Deposition.This also gives methods for the preparation of Coatings on Thin Film and Coating methods to increase the efficiencies of these methods.