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Monte Carlo simulation of full energy spectrum of electrons emitted from silicon in Auger electron spectroscopy

机译:俄歇电子能谱中硅发射电子的全能谱的蒙特卡罗模拟

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摘要

A Monte Carlo simulation including surface excitation, Auger electron- and secondary electron production has been performed to calculate the energy spectrum of electrons emitted from silicon in Auger electron spectroscopy (AES), covering the full energy range from the elastic peak down to the true-secondary-electron peak. The work aims to provide a more comprehensive understanding of the experimental AES spectrum by integrating the up-to-date knowledge of electron scattering and electronic excitation near the solid surface region. The Monte Carlo simulation model of beam-sample interaction includes the atomic ionization and relaxation for Auger electron production with Casnati's ionization cross section, surface plasmon excitation and bulk plasmon excitation as well as other bulk electronic excitation for inelastic scattering of electrons (including primary electrons, Auger electrons and secondary electrons) through a dielectric functional approach, cascade secondary electron production in electron inelastic scattering events, and electron elastic scattering with use of Mott's cross section. The simulated energy spectrum for Si sample describes very well the experimental AES EN(E) spectrum measured with a cylindrical mirror analyzer for primary energies ranging from 500eV to 3000eV. Surface excitation is found to affect strongly the loss peak shape and the intensities of the elastic peak and Auger peak, and weakly the low energy backscattering background, but it has less effect to high energy backscattering background and the Auger electron peak shape. Copyright (c) 2014 John Wiley & Sons, Ltd.
机译:已经进行了包括表面激发,俄歇电子和二次电子产生在内的蒙特卡洛模拟,以计算俄歇电子能谱(AES)中从硅发射的电子的能谱,涵盖了从弹性峰到真实的整个能量范围。二次电子峰。这项工作旨在通过整合固体表面附近电子散射和电子激发的最新知识,提供对实验AES光谱的更全面的了解。束-样品相互作用的蒙特卡洛模拟模型包括具有卡纳蒂电离截面的俄歇电子产生的原子电离和弛豫,表面等离激元激发和体等离激元激发以及其他用于电子(包括一次电子)非弹性散射的体电子激发。通过介电功能方法,在电子非弹性散射事件中级联二次电子的产生以及利用Mott截面的电子弹性散射来进行俄歇电子和二次电子)。 Si样品的模拟能谱很好地描述了用柱面镜分析仪测得的一次能量为500eV至3000eV的实验AES EN(E)光谱。发现表面激发强烈影响损耗峰的形状和弹性峰和俄歇峰的强度,而对低能背散射背景的影响较弱,但对高能背散射背景和俄歇电子峰形状的影响较小。版权所有(c)2014 John Wiley&Sons,Ltd.

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