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首页> 外文期刊>Surface & Coatings Technology >Structural and mechanical property of Si incorporated (Ti,Cr,Al)N coatings deposited by arc ion plating process
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Structural and mechanical property of Si incorporated (Ti,Cr,Al)N coatings deposited by arc ion plating process

机译:通过电弧离子镀工艺沉积的掺Si(Ti,Cr,Al)N涂层的结构和力学性能

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摘要

(Ti,Cr,Al,Si)N coatings with different Al+Si fractions (0.6 and 0.65) were deposited by an arc ion plating (AIP) apparatus that is equipped with the plasma-enhanced type arc cathode. The (Ti,CrAl,Si)N coatings were deposited under different substrate bias voltages and effect of the deposition parameter on the composition, structure and mechanical properties was investigated. X-ray diffraction measurements of the (Ti,Cr,Al,Si)N coating deposited under different substrate bias voltages revealed that formation of the hexagonal phase (Wurzite structure) was only limited to a relatively low bias voltage range of 20 to 30 V. Above this bias voltage, the crystal structure of the coatings was single-phased cubic rock-salt structure (B1 phase) independent of the bias voltage. Grain size of the coating was calculated from the full width of half maximum (FWHM) of the X-ray diffraction peak and it was smaller than the one of conventional (Ti,AI)N or (Ti,Cr,Al)N coating with a comparable Al fraction. The grain size estimated from the cross-sectional TEM observation was less than 10 run. From the TEM observation, the coating was compositionally homogeneous and there was no evidence that the film had a phase separation such as Si-rich and -poor region. Hardness of the (Ti,Cr,Al,Si)N coating with Al+Si-0.6 was in the range of 26 to 27 GPa independent of the substrate bias. (Ti,Cr,Al,Si)N coating with AI+Si=0.65 showed slight increase in hardness from 24 to 27 GPa when the substrate bias was increased to more than 100 V To evaluate the oxidation resistance, annealing tests in the air at 1000 degrees C were conducted and surface SEM observations revealed that surface of the conventional (Ti,AI)N and (Ti,Cr,AI)N was covered with coarse oxide grains enriched with TiO2. Whereas only a dense but very thin protective oxide layer was observed in case of (Ti,CrAl,Si)N coating after the oxidation. These coatings were applied to the high-speed dry cutting tests against hardened D2 steel (HRC 60) and the result clearly indicated better performance of (Ti,Cr,Al,Si)N compared to the conventional coatings such as (Ti,AI)N and (Ti,Cr,Al)N. (c) 2005 Elsevier B.V. All rights reserved.
机译:通过配备有等离子体增强型电弧阴极的电弧离子镀(AIP)设备沉积具有不同Al + Si分数(0.6和0.65)的(Ti,Cr,Al,Si)N涂层。在不同的衬底偏压下沉积了(Ti,CrAl,Si)N涂层,并研究了沉积参数对组成,结构和力学性能的影响。在不同的基板偏置电压下沉积的(Ti,Cr,Al,Si)N涂层的X射线衍射测量结果表明,六方相(Wurzite结构)的形成仅限于20至30 V的相对较低的偏置电压范围在该偏置电压之上,涂层的晶体结构是与偏置电压无关的单相立方岩盐结构(B1相)。根据X射线衍射峰的半峰全宽(FWHM)计算涂层的晶粒尺寸,该尺寸小于传统的(Ti,Al)N或(Ti,Cr,Al)N涂层,可比的Al分数。由截面TEM观察估计的晶粒尺寸小于10nm。从TEM观察,涂层在成分上是均匀的,并且没有证据表明该膜具有诸如富Si和贫Si区的相分离。 Al + Si-0.6的(Ti,Cr,Al,Si)N涂层的硬度在26至27 GPa的范围内,与基材偏压无关。当基材偏压增加到100 V以上时,具有AI + Si = 0.65的(Ti,Cr,Al,Si)N涂层的硬度从24 GPa略微增加到27 GPa。进行了1000摄氏度的温度扫描和表面SEM观察,发现常规(Ti,Al)N和(Ti,Cr,AI)N的表面覆盖有富含TiO2的粗氧化物颗粒。而在氧化后(Ti,CrAl,Si)N涂层的情况下,仅观察到致密但非常薄的保护性氧化物层。这些涂层已针对硬化D2钢(HRC 60)进行了高速干切削试验,结果清楚地表明(Ti,Cr,Al,Si)N的性能优于常规涂层(Ti,AI) N和(Ti,Cr,Al)N。 (c)2005 Elsevier B.V.保留所有权利。

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