Investigation of nanocrystal-(Ti1-xAlx)N-y/amorphous-Si3N4 nanolaminate films

摘要

Nanocrystal-(Ti1-xAlx)N-y/amorphous-Si3N4 nanolanimate films were deposited periodically via reactive magnetron sputtering technique. The effects of the thickness of multilayer period on the microstructure and mechanical properties were investigated by X-ray diffraction, scanning and transmission electron microscopies, nanoindentation and scratching adhesion testing. Results indicate that the nanolammate structure is uniform and good flatness interfaces under different multilayer periods. The nanolaminate films exhibited a maximum hardness when the multilayer structure had a period of lambda = 25 nm and were harder than monolayer (Ti1-xAlx)N-y or Si3N4 films of the same thickness. The critical scratching load of the nanolammates was higher than that of monolayer specimens with the same thickness. The mechanisms of fracture and toughening of nanolaminate films are also discussed. (c) 2004 Published by Elsevier B.V.