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Structural and tribological characterization of multilayer ta-C films prepared by filtered cathodic vacuum arc with substrate pulse biasing

机译:过滤后的阴极真空电弧和衬底脉冲偏压制备的多层ta-C薄膜的结构和摩擦学特性

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摘要

The filtered cathodic vacuum arc (FCVA) technique is reported to be an effective method for producing high quality hard coatings, but has limitations for preparing thick hard tetrahedral amorphous carbon (ta-C) films by the conventional method of floating conditions. Currently, the multilayer approach is the only way to overcome this limitation, and is of great interest because it enables the fabrication of films with varied thickness and properties to suit the application. A multilayer ta-C film of approximately 1μm thickness is prepared on a silicon substrate by alternate soft (20 nm thick) and hard (100 nm thick) layers of tetrahedral amorphous carbon. The compressive stress of the film measured using the radius of curvature technique, profiled by stylus, is found to be approximately 5.4 GPa. The bond structure of the film is studied using Raman spectroscopy and is typical of films containing reasonably high sp{sup}3 fractions, with an I{sub}D/I{sub}G ratio of approximately 0.265. The hardness and elastic modulus of the film are approximately 57 and 550 GPa, respectively, which are fairly high for thick ta-C films. The coefficient of friction and wear rate of the ta-C film against a sapphire counter-face are observed to be relatively low. This investigation finds that the ta-C films of relatively high thickness, with favorable hardness and tribological properties, can be prepared by FCVA with alternate substrate pulse biasing.
机译:据报道,过滤阴极真空电弧(FCVA)技术是生产高质量硬质涂层的有效方法,但是在通过常规的漂浮条件法制备厚硬质四面体非晶碳(ta-C)薄膜方面存在局限性。当前,多层方法是克服该限制的唯一方法,并且由于它使得能够制造具有不同厚度和性质以适合应用的膜而引起了极大的兴趣。通过四面体无定形碳的交替软(20 nm厚)和硬(100 nm厚)层在硅基板上制备厚度约为1μm的多层ta-C膜。发现使用触针测绘的使用曲率半径技术测量的膜的压缩应力约为5.4 GPa。使用拉曼光谱研究膜的键结构,这是包含相当高的sp {sup} 3馏分且I {sub} D / I {sub} G比约为0.265的膜的典型结构。薄膜的硬度和弹性模量分别约为57和550 GPa,对于厚的ta-C薄膜而言相当高。观察到ta-C膜对蓝宝石背面的摩擦系数和磨损率相对较低。该研究发现,可以通过具有交替的衬底脉冲偏压的FCVA来制备具有较高的厚度,具有良好的硬度和摩擦学性能的ta-C膜。

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