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Correlations between process parameters and film properties of diamond-like carbon films formed by hydrocarbon plasma immersion ion implantation

机译:烃等离子体浸没离子注入形成类金刚石碳膜的工艺参数与膜性能的关系

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摘要

Plasma immersion ion implantation with hydrocarbon gases (HC-PIII) leads to both carbon implantation and carbon thin film deposition. The films are diamond-like carbon (DLC), mostly amorphous carbon with hydrogen (a-C:H). In the present review, examples from the literature on the deposition of HC-PIII DLC films are discussed. The process parameters of HC-PIII, including bias voltage, plasma-forming gas, and experimental setup, are correlated with the properties of the DLC film, such as bonding characteristics, hardness, stress state, and the resulting tribological performance, as shown in friction and wear tests.
机译:用碳氢化合物气体(HC-PIII)进行的等离子体浸没离子注入会导致碳注入和碳薄膜沉积。薄膜是类金刚石碳(DLC),主要是带有氢的非晶碳(a-C:H)。在本综述中,讨论了有关HC-PIII DLC膜沉积的文献实例。 HC-PIII的工艺参数(包括偏置电压,等离子体形成气体和实验设置)与DLC膜的特性(如键合特性,硬度,应力状态和所得的摩擦学性能)相关,如图所示。摩擦和磨损测试。

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