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Advances in PSII techniques for surface modification

机译:PSII表面改性技术的进展

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Recent activities in plasma source ion implantation (PSII) technology include scale-up demonstrations for industry and development of variations on the original PSII concept for surface modification. This paper presents an overview of the continued growth of PSII research facilities world-wide and the industrial demonstrations within the USA. In order to expand the applicability of PSII, Los Alamos is actively researching a PSII-related technique called plasma immersion ion processing (PIIP). In one case, a pulsed-biased target can be combined with cathodic are sources to perform ion implantation and coating deposition with metal plasmas. Erbium plasmas have been combined with oxygen to deposit erbia (Er2O3) coatings that are useful for containment of molten metals. In a second case, hydrocarbon, inorganic and organometallic gases are utilized to create a graded interface between the substrate and the coating that is subsequently deposited by using pulsed-bias techniques. PIIP represents a significant advance since it allows coating deposition with all the strengths of the original PSII approach. Diamond-like carbon (DLC) and boron carbide are two such coatings that will be highlighted here for tribological applications. (C) 1998 Elsevier Science S.A. [References: 16]
机译:等离子体源离子注入(PSII)技术的最新活动包括扩大规模的工业演示,以及用于表面修饰的原始PSII概念的变体开发。本文概述了PSII研究机构在全球范围内的持续发展以及美国境内的工业示范。为了扩大PSII的适用性,Los Alamos积极研究与PSII相关的技术,称为等离子浸入离子处理(PIIP)。在一种情况下,可以将脉冲偏压靶与阴极源结合,以执行离子注入和金属等离子体涂层的沉积。 plasma等离子体已与氧气结合在一起,以沉积可用于遏制熔融金属的erbia(Er2O3)涂层。在第二种情况下,利用碳氢化合物,无机金属和有机金属气体在基材和涂层之间形成梯度界面,随后通过使用脉冲偏压技术对其进行沉积。 PIIP代表了一项重大进步,因为它可以利用原始PSII方法的所有优势进行涂层沉积。类金刚石碳(DLC)和碳化硼是两种此类涂层,在摩擦学应用中将重点介绍。 (C)1998 Elsevier Science S.A. [参考:16]

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