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首页> 外文期刊>Surface & Coatings Technology >Effects of high temperature annealing on MOCVD grown CaCu3Ti4O12 films on LaAlO3 substrates
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Effects of high temperature annealing on MOCVD grown CaCu3Ti4O12 films on LaAlO3 substrates

机译:高温退火对在LaAlO3衬底上MOCVD生长的CaCu3Ti4O12薄膜的影响

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Calcium copper titanate, CaCU3Ti4O12 (CCTO), thin films have been fabricated by Metal Organic Chemical Vapor Deposition (MOCVD) on LaAlO3(100) single crystal substrates. Depositions have been carried out from a molten mixture consisting of the Ca(hfa)(2)center dot tetraglyme, Ti(tmhd)(2) (O-iPr)(2), and Cu(tmhd)(2) [Hhfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme=2,5,8,11,14-pentaoxapentadecane; Htmhd=2,2,6,6-tetramethyl-3,5 -heptandione; O-iPr=iso-propoxide] precursors. Post-deposition annealing treatments have been performed at 1100 degrees C for long time (24 h) as well as by rapid thermal annealing (RTA) processes. Since structural and chemical properties of CCTO ceramics greatly affect the resulting dielectric properties, accurate structural, morphological and compositional characterizations of the annealed samples have been performed by X-ray diffraction, field emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray analysis (EDX). Oriented films have been obtained after both long time annealings and RTA processes, while different morphologies have been observed: similar to 600 run wide rounded grains and very large (similar to 5 pm) squared grains, respectively. (c) 2007 Elsevier B.V. All rights reserved.
机译:钛酸铜钙CaCU3Ti4O12(CCTO)薄膜是通过在LaAlO3(100)单晶衬底上进行金属有机化学气相沉积(MOCVD)制备的。已从由Ca(hfa)(2)中心点四甘醇二甲醚,Ti(tmhd)(2)(O-iPr)(2)和Cu(tmhd)(2)组成的熔融混合物中进行沉积。 1,1,1,5,5,5-六氟-2,4-戊二酮;四甘醇二甲醚= 2,5,8,11,14-五氧杂十五碳烷; Htmhd = 2,2,6,6-四甲基-3,5-庚二酮; O-iPr =异丙醇]前体。沉积后退火处理已在1100摄氏度下进行了长时间(24 h)以及快速热退火(RTA)工艺。由于CCTO陶瓷的结构和化学性质极大地影响了所得的介电性能,因此已通过X射线衍射,场发射扫描电子显微镜(FE-SEM)和能量色散X-射线对退火样品进行了准确的结构,形态和成分表征射线分析(EDX)。经过长时间的退火和RTA处理后,获得了取向膜,同时观察到了不同的形貌:分别类似于600个宽圆形晶粒和非常大(类似于5 pm)的方形晶粒。 (c)2007 Elsevier B.V.保留所有权利。

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