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Optimization and control of a plasma carburizing process by means of optical emission spectroscopy

机译:利用光发射光谱法优化和控制等离子渗碳工艺

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In this work optical emission spectroscopy (OES) is used to characterize the dissociation process of methane in an argon/hydrogen/methane discharge for plasma carburizing. The optical emission spectra of the discharge have been measured as a function of process parameters: discharge voltage, pulse duration and pulse pause time. A correlation between the intensities of hydrocarbon molecules, carbon atoms and ions, and the carbon mass flow model of the carburizing process has been confirmed. The dominant species identified in the spectra used for correlation are excited and ionized carbon atoms, as well as excited carbon and hydrocarbon molecules such as excited CH with a molecular band at 431.42 nm and 314.41 nm, and excited C-2 with a molecular band at 501.50 nm. Excited carbon atoms at 493.21 nm and excited carbon ions at 387.17 nm and 426.70 nm are also detected. It can be concluded that the intensity of excited CH molecules at a molecular band at 431.42 nm is a function of pulse duration time, voltage and pulse pause time, respectively, indicating that carbon mass flow ((m)over-dot(c)) is directly proportional to the intensities of emission. This means that OES allows in situ, real-time control of the plasma carburizing process. (C) 1998 Elsevier Science S.A. [References: 10]
机译:在这项工作中,使用光发射光谱法(OES)来表征用于等离子渗碳的氩气/氢气/甲烷排放中甲烷的离解过程。放电的光发射光谱已根据过程参数进行了测量:放电电压,脉冲持续时间和脉冲暂停时间。已经证实了碳氢化合物分子,碳原子和离子的强度与渗碳过程的碳质量流模型之间的相关性。在用于相关性的光谱中确定的主要物质是受激和电离的碳原子,以及受激碳和烃分子,例如具有在431.42 nm和314.41 nm的分子带的受激CH和在C.2的分子带的受激C-2。 501.50 nm。还检测到493.21 nm处的激发碳原子和387.17 nm和426.70 nm处的激发碳离子。可以得出结论,在431.42 nm的分子带上被激发的CH分子的强度分别是脉冲持续时间,电压和脉冲停顿时间的函数,表明碳质量流量((m)over-dot(c))与发射强度成正比。这意味着OES可以对等离子体渗碳过程进行原位实时控制。 (C)1998 Elsevier Science S.A. [参考:10]

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