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Tribological behaviour of electrodeposited cobalt-tungsten coatings: dependence on current parameters

机译:电沉积钴钨涂层的摩擦学行为:对电流参数的依赖

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摘要

The tribological behaviour of cobalt-tungsten alloy coatings electrodeposited under direct or pulse current mode from a cobalt sulphate-sodium tungstate bath was investigated. At a low average current density of 0.5 A dm{sup}(-2) the coatings contain a low amount of tungsten that leads to a milky appearance of the coatings. These coatings have a high roughness, a low hardness, and exhibit a high coefficient of friction and a high wear in sliding tests against corundum. In contrast, cobalt-tungsten coatings deposited at a higher average current density of 1 A dm{sup}(-2) also have a milky appearance but exhibit tribological properties comparable to the ones of electrodeposited hard chromium and physical vapour deposited TiN.
机译:研究了在硫酸钴-钨酸钠浴中直流电或脉冲电流模式下电沉积的钴钨合金涂层的摩擦学行为。在0.5 A dm {sup}(-2)的低平均电流密度下,涂层含有少量的钨,导致涂层出现乳白色。这些涂层具有高粗糙度,低硬度,并且在针对刚玉的滑动试验中表现出高摩擦系数和高磨损。相比之下,以1 A dm {sup}(-2)更高的平均电流密度沉积的钴钨涂层也具有乳白色外观,但具有与电沉积硬铬和物理气相沉积TiN相当的摩擦学性能。

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