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PCB153-induced oxidative stress and cell apoptosis on cultured rat Sertoli cells

机译:PCB153诱导的大鼠支持细胞的氧化应激和细胞凋亡

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摘要

In this study, we explored the temporal characteristics of superoxide dismutase (SOD) activity, malondialdehyde (MDA) concentration, and the effect of oxidative stress on DNA damage, and cell apoptosis after exposure to 2,4,5,2',4',5'-hexachlorobiphenyl (PCB153) on cultured rat Sertoli cells (SC). SOD activity and MDA concentration were determined after cell exposure to 10, 20, 30 mu mol L-1 PCB153 for 6, 12, 24, 36 or 48 h. Antioxidant N-acetyl-L-cysteine (NAC) was added to one group as a pre-treatment at the time point having the best dose-effect relationship. DNA damage, cell apoptosis, and morphological observation were determined by comet assay, flow cytometry, and fluorescence photomicrographs, respectively. After exposure to PCB153, SOD activity increased initially, but decreased subsequently. Each group reached a respective maximum value after 24 h when MDA concentration started increasing. No significant difference was observed in DNA damage after 24 h exposure, but cell apoptosis increased with the level of PCB153, although NAC-pretreatment provided protection. These were corroborated by the morphological observation. These findings suggest that 24 h was the best time point to determine oxidative stress indicators after exposure to PCB153 on cultured rat SC. Furthermore, PCB153-induced oxidative stress could increase cell apoptosis, while DNA damage was not evident.
机译:在这项研究中,我们探讨了超氧化物歧化酶(SOD)活性,丙二醛(MDA)浓度的时间特性,以及氧化应激对DNA损伤和暴露于2,4,5,2',4'后细胞凋亡的影响。培养的大鼠支持细胞(SC)上的5'-六氯联苯(PCB153)。在细胞暴露于10、20、30μmolL-1 PCB153 6、12、24、36或48 h后,测定SOD活性和MDA浓度。在具有最佳剂量效应关系的时间点将抗氧化剂N-乙酰基-L-半胱氨酸(NAC)添加到一组中作为预处理。 DNA损伤,细胞凋亡和形态观察分别通过彗星试验,流式细胞术和荧光显微照片确定。暴露于PCB153后,SOD活性最初增加,但随后降低。当MDA浓度开始增加24小时后,每组达到各自的最大值。暴露24 h后,DNA损伤未见明显差异,但细胞凋亡随PCB153水平的升高而增加,尽管NAC预处理提供了保护作用。这些被形态观察证实。这些发现表明,在培养的大鼠SC上暴露于PCB153后,24小时是确定氧化应激指标的最佳时间点。此外,PCB153诱导的氧化应激可以增加细胞凋亡,而DNA损伤并不明显。

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