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首页> 外文期刊>Chemical Physics Letters >Growth of well-aligned carbon nanotubes on a large area of Co-Ni co-deposited silicon oxide substrate by themal chemical vapor deposition
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Growth of well-aligned carbon nanotubes on a large area of Co-Ni co-deposited silicon oxide substrate by themal chemical vapor deposition

机译:通过热化学气相沉积法在大面积Co-Ni共沉积氧化硅衬底上生长取向良好的碳纳米管

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摘要

We have grown vertically well-aligned multiwalled multiwalled carbon nanotubes (CNT) on a large area of cobalt-nickel (Co-Ni)co-deposited silicon oxide substrate by thermal vapor deposition using C_2H_2 gas,at 950deg C.The diameter of CNTs is in the range of 50-120 nm and the length is about 130 #mu#m,The grown CNTs have a bamboo structure and closd tip with no catalytic particles inside.As the particle size of Co-Ni catalyst decreases,the vertical alignment is enhanced.The CNTs exhibits a low turn-on voltage of 0.8 V/#mu# with an emission current density of 0.1 #mu#A cm~(-2).
机译:我们已经通过使用C_2H_2气体在950°C下通过热气相沉积法在大面积钴镍(Co-Ni)共沉积的氧化硅衬底上生长了垂直取向良好的多壁多壁碳纳米管(CNT).CNT的直径为在50-120 nm范围内,长度约为130#mu#m,生长的碳纳米管具有竹结构,尖端封闭,内部没有催化颗粒。随着Co-Ni催化剂粒径的减小,垂直取向为碳纳米管的导通电压低至0.8 V /#mu#,发射电流密度为0.1#mu#A cm〜(-2)。

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