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首页> 外文期刊>The journal of physics and chemistry of solids >Electronic and structural changes induced by irradiation or annealing in pulsed laser deposited As50Se50 films. An XPS and UPS study
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Electronic and structural changes induced by irradiation or annealing in pulsed laser deposited As50Se50 films. An XPS and UPS study

机译:由脉冲或激光沉积的As50Se50薄膜中的辐照或退火引起的电子和结构变化。 XPS和UPS研究

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摘要

The response of amorphous AS(50)Se(50) pulsed laser deposited (PLD) films to annealing and irradiation, was investigated by X-ray and UV-photoelectron spectroscopies. It is shown that annealing smoothes out structural as well as electronic defects, while irradiation with near band-gap light enhances the film's "chemical disorder" and causes the creation of electronic defects. The observed behavior of the films is compared to that of thermally evaporated films and the corresponding bulk glasses. (C) 2007 Elsevier Ltd. All rights reserved.
机译:通过X射线和紫外光电子能谱研究了非晶态AS(50)Se(50)脉冲激光沉积(PLD)膜对退火和辐照的响应。结果表明,退火可以消除结构缺陷和电子缺陷,而近带隙光的照射则增强了薄膜的“化学无序性”,并导致了电子缺陷的产生。将膜的观察到的行为与热蒸发膜和相应的块状玻璃的观察到的行为进行比较。 (C)2007 Elsevier Ltd.保留所有权利。

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