...
首页> 外文期刊>The journal of physics and chemistry of solids >Zn incorporation and (CuIn)_(1-x)Zn_(2x)Se_2 thin film formation during the selenization of evaporated Cu and in precursors on Al:ZnO coated glass substrates
【24h】

Zn incorporation and (CuIn)_(1-x)Zn_(2x)Se_2 thin film formation during the selenization of evaporated Cu and in precursors on Al:ZnO coated glass substrates

机译:在蒸镀的铜的硒化过程中以及在Al:ZnO涂覆的玻璃基板上的前体中,Zn的掺入和(CuIn)_(1-x)Zn_(2x)Se_2薄膜的形成

获取原文
获取原文并翻译 | 示例
           

摘要

CuInSe_2 thin films with typical 1.0 eV gap energy and tetragonal chalcopyrite structure have been obtained on sodalime glass substrates by the reaction of sequentially evaporated Cu and In layers with elemental selenium vapor, at 500 °C in flowing Ar. When analogous deposition and reaction processes were performed on Al:ZnO coated glasses, some increment in the band gap energy and diminution in the crystalline interplanar spacings have been detected for the resulting films with an extent that depends on the Cu/In atomic ratio of the evaporated precursor layers. This fact has been related to Zn incorporation into the selenized film, with quaternary (CuIn) _(1-x)Zn_(2x)Se_2 compound formation that is influenced by the presence of copper selenide phases during the reaction process. Such deductions are supported by the optical, structural and compositional characterizations that have been performed comparatively on samples prepared by selenization of evaporated metallic precursors with two different Cu/In ratios (0.9 and 1.1) on bare and Al:ZnO coated glass substrates.
机译:通过依次蒸发的Cu和In层与元素硒蒸气,在500°C的氩气中反应,在钠钙玻璃衬底上获得了具有典型1.0 eV间隙能和四方黄铜矿结构的CuInSe_2薄膜。当在镀有Al:ZnO的玻璃上进行类似的沉积和反应过程时,已发现所得薄膜的带隙能量有所增加,结晶晶面间距也有所减小,其程度取决于合金的Cu / In原子比。蒸发的前体层。这一事实与锌掺入硒化膜中有关,季铵化(CuIn)_(1-x)Zn_(2x)Se_2化合物的形成受反应过程中硒化铜相的存在影响。此类推论得到光学,结构和成分表征的支持,这些表征是在裸露的和涂有Al:ZnO的玻璃基板上通过硒化两种不同Cu / In比(0.9和1.1)的蒸发的金属前驱体硒化而制备的样品上进行的。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号