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首页> 外文期刊>The journal of physics and chemistry of solids >Preparation of dielectric mirrors from high-refractive index contrast amorphous chalcogenide films
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Preparation of dielectric mirrors from high-refractive index contrast amorphous chalcogenide films

机译:用高折射率对比非晶硫族化物薄膜制备介电镜

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We report the preparation of planar 15-layer dielectric mirrors by a thermal evaporation of alternating high refractive index contrast amorphous chalcogenide Sb-Se and Ge-S layers, exhibiting a high-reflection band around 1.55 mu m. The layer deposition quality and the thickness accuracy of such prepared chalcogenide multilayers were then checked using transmission electron microscopy. The layer thickness deviation of chalcogenide layers did not exceed similar to 7 nm in comparison with the desired thicknesses. The width of Sb-Se/Ge-S layer boundary was approximately similar to 3nm, which is in good agreement with the surface roughness values of thermally evaporated Sb-Se and Ge-S single layers. The optical properties of the prepared 15-layer dielectric mirrors were consistent in temperature range of 20-120 degrees C; however, at higher temperatures there started apparent structural changes of Sb-Se films, which were followed by their crystallization. Excellent optical properties of chalcogenide materials in the infrared range make them interesting for applications, e.g., in optics and photonics. (c) 2008 Elsevier Ltd. All rights reserved.
机译:我们报告了通过交替蒸发高折射率对比非晶态硫族化物Sb-Se和Ge-S层的热蒸发来制备平面15层介电镜,表现出约1.55μm的高反射带。然后使用透射电子显微镜检查这种制备的硫族化物多层的层沉积质量和厚度精度。与期望的厚度相比,硫属化物层的层厚度偏差不超过类似于7nm。 Sb-Se / Ge-S层边界的宽度大约与3nm相似,这与热蒸发Sb-Se和Ge-S单层的表面粗糙度值非常吻合。所制备的15层介电镜的光学性能在20-120℃的温度范围内是一致的。然而,在更高的温度下,Sb-Se薄膜开始出现明显的结构变化,随后结晶。硫属化物材料在红外范围内的出色光学性能使其成为光学,光子学等应用的关注点。 (c)2008 Elsevier Ltd.保留所有权利。

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