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首页> 外文期刊>Chemistry of Materials: A Publication of the American Chemistry Society >Exploring Pore Formation of Atomic Layer-Deposited Overlayers by in Situ Small- and Wide-Angle X-ray Scattering
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Exploring Pore Formation of Atomic Layer-Deposited Overlayers by in Situ Small- and Wide-Angle X-ray Scattering

机译:通过原位小角度和广角X射线散射探索沉积原子层的覆盖层的孔形成

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摘要

In this work, we explore the pore structure of overcoated materials by in situ synchrotron small-angle (SAXS) and wide-angle X-ray scattering (WAXS). Thin films of aluminum oxide (Al2O3) and titanium dioxide (TiO2) with thicknesses of 4.9 and 2.5 nm, respectively, are prepared by atomic layer deposition (ALD) on nonporous nanoparticles. In situ X-ray measurements reveal that porosity is induced in the ALD films by annealing the samples at high temperatures. Moreover, this pore formation can be attributed to densification resulting from an amorphous to crystalline phase transition of the ALD films as confirmed by high-resolution X-ray diffraction and the pair distribution function. Simultaneous SAXS and WAXS results show not only that the porosity is formed by the phase transition but also that the pore size increases with temperature.
机译:在这项工作中,我们通过原位同步加速器小角度(SAXS)和广角X射线散射(WAXS)探索了被覆材料的孔结构。通过在无孔纳米粒子上进行原子层沉积(ALD)制备厚度分别为4.9和2.5 nm的氧化铝(Al2O3)和二氧化钛(TiO2)薄膜。 X射线原位测量表明,通过在高温下对样品进行退火,在ALD膜中产生了孔隙。此外,这种孔的形成可以归因于由高分辨率X射线衍射和成对分布函数所证实的ALD膜从无定形到结晶相转变所致的致密化。 SAXS和WAXS的同时结果表明,不仅孔隙是由相变形成的,而且孔径随温度的增加而增加。

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