Electron-Beam Lithography for Patterning Biomolecules at the Micron and Nanometer Scale

摘要

This review summarizes the use of electron beam (e-beam) lithography to pattern biomolecules on surfaces. The focus is on approaches that employ poly{ethylene glycol) (PEG) resists. Overview of the different strategies used, including ablation of self-assembled monolayers and cross-linking of PEG, is provided. Subsequent use of surfaces to immobilize cells for tissue engineering applications is summarized.