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THE ELECTRON AFFINITIES OF THE SILICON FLUORIDES SIFN (N=1-5)

机译:硅氟化物SIFN(N = 1-5)的电子亲和力

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Several independent density functional methods have been employed to determine the molecular structures and total energies of SiFn and SiFn- (n=1-5). Three significant measures of neutral-anion separation are reported: the adiabatic electron affinity, the vertical electron affinity, and the vertical detachment energy of the anion. The first Si-F ligand dissociation energies D(Fn-1Si-F), D(Fn-1Si--F), and D(Fn-1Si-F-) as well as the harmonic vibrational frequencies of SiFn and SiFn- are also reported. Trends in the predictions of the different DFI: methods are discussed. Self-consistent Kohn-Sham orbitals were obtained using various exchange correlation functionals and a double-zeta plus polarization basis set augmented with diffuse s-type and p-type functions. The method (BHLYP) based upon the Becke half-and-half exchange functional and the Lee-Yang-parr correlation functional predicts molecular geometries in best agreement with experiment, while the other methods tend to produce bond lengths that are slightly longer. The BHLYP vibrational frequencies are also superior to those obtained via the other three DFT methods utilized. In previous studies of AF(n) molecules, the density functional methods have predicted electron affinities a few tenths of an electron volt above experiment with the BHLYP value being the best. Although experimental information concerning the electron affinities of the SiFn series is scarce, the BHLYP method does continue to predict electron affinities that art: lower than the other methods. The BHLYP adiabatic electron affinities are 0.83 eV (SiF), 0.42 eV (SiF2), 2.50 eV (SiF3), and -0.22 eV (SiF4). The (unknown) Si-F bond distances for the anions are 0.076-0.088 Angstrom longer than their respective neutral counterparts. The SiF3- anion is more strongly pyramidal than SiF3. The SiF4- species is predicted to lie energetically above SiF4, despite its experimental identification. No significantly bound minimum was found for the SiF5 molecule, although SiF5- is predicted to exist and M(+)SiF(5)(-) has been experimentally observed. The predicted vertical detachment energy of SiF5- is 8.54 eV with the BHLYP method. (C) 1995 American Institute of Physics. [References: 54]
机译:已经采用了几种独立的密度泛函方法来确定SiFn和SiFn-(n = 1-5)的分子结构和总能量。报告了中性阴离子分离的三种重要方法:绝热电子亲和力,垂直电子亲和力和阴离子的垂直脱离能。第一个Si-F配体离解能D(Fn-1Si-F),D(Fn-1Si-F)和D(Fn-1Si-F-)以及SiFn和SiFn-的谐波振动频率为也有报道。讨论了不同DFI:方法的预测趋势。使用各种交换相关函数和具有扩散s型和p型函数的双Zeta加极化基集获得自洽的Kohn-Sham轨道。基于Becke半和一半交换函数和Lee-Yang-parr相关函数的方法(BHLYP)可以预测与实验最一致的分子几何形状,而其他方法则倾向于产生更长的键长。 BHLYP振动频率也优于通过其他三种DFT方法获得的振动频率。在以前对AF(n)分子的研究中,密度泛函方法预测的电子亲和力比实验高出十分之一电子伏特,而BHLYP值最好。尽管缺乏有关SiFn系列电子亲和力的实验信息,但BHLYP方法确实继续预测了现有技术中的电子亲和力:低于其他方法。 BHLYP绝热电子亲和力为0.83 eV(SiF),0.42 eV(SiF2),2.50 eV(SiF3)和-0.22 eV(SiF4)。阴离子的(未知)Si-F键距离比其各自的中性对应物长0.076-0.088埃。 SiF3阴离子比SiF3更呈锥体状。尽管有实验证明,但预计SiF4-物种在能量上高于SiF4。尽管预计SiF5-存在并且已通过实验观察到M(+)SiF(5)(-),但未发现SiF5分子的显着结合极小值。使用BHLYP方法预测的SiF5-垂直脱离能为8.54 eV。 (C)1995年美国物理研究所。 [参考:54]

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