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Dissociative chemisorption of CH4 on Ni: The role of molecular orientation

机译:CH4在Ni上的解离化学吸附:分子取向的作用

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The dissociation of CH4 on a Ni surface is examined quantum mechanically. The molecule is treated as a quasidiatomic R-H, where R=CH3, and vibrational, rotational, and translational motion normal to the surface are included. The metal surface is assumed to be flat and the potential energy surface is based on ab initio studies of dissociation over the Ni(111) atop site. Lattice motion is introduced via the surface mass model. Bessel-Legendre and fast Fourier transform pseudospectral techniques are used to evolve the wave function in time, and energy resolved reactive fluxes are extracted via a time-to-energy transform. Agreement with experiment is good, particularly with regard to the dependence of the dissociation probability on incident energy and surface temperature. The dynamics of the dissociation reaction for the various initial states of the molecule are examined. (C) 1998 American Institute of Physics. [References: 63]
机译:用量子力学方法研究了Ni表面上CH4的解离。该分子被视为准原子R-H,其中R = CH3,并且包括垂直于表面的振动,旋转和平移运动。假定金属表面是平坦的,势能表面是基于从头开始对Ni(111)顶部位点解离的研究。晶格运动是通过表面质量模型引入的。使用Bessel-Legendre和快速傅里叶变换伪光谱技术来及时演化波函数,并通过时间-能量变换来提取能量分辨的无功通量。与实验的一致性很好,特别是在解离概率对入射能量和表面温度的依赖性方面。检查了分子的各种初始状态的解离反应的动力学。 (C)1998美国物理研究所。 [参考:63]

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