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Monte carlo simulations of growth modes of Pb nanoislands on Si(111) surface

机译:Si(111)表面Pb纳米岛生长模式的蒙特卡罗模拟

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The growth of Pb islands on a Si(111) surface exhibits many interesting properties. For example, the self-assembled process results in a homogeneous distribution of Pb islands with uniform height. The dependence of this height on coverage and temperature can be expressed as a phase diagram [1]. In this paper we develop a model of the growth process that reflects the main features of the experimental observations and determines the key processes of quantum dot formation in a Pb/Si(111) system. The growth of islands is simulated by the Monte Carlo method. With suitably chosen parameters the model is able to reconstruct the phase diagram, via the dependence of the dynamics of Pb atoms on area and height. These dependencies are attributed to stress energy and quantum size effects.
机译:Si(111)表面上Pb岛的生长显示出许多有趣的特性。例如,自组装过程导致具有均匀高度的Pb岛均匀分布。该高度对覆盖率和温度的依赖性可以表示为相图[1]。在本文中,我们开发了一个生长过程模型,该模型反映了实验观察的主要特征,并确定了Pb / Si(111)系统中量子点形成的关键过程。岛屿的增长通过蒙特卡洛方法进行模拟。利用适当选择的参数,该模型能够通过Pb原子动力学对面积和高度的依赖性来重建相图。这些依赖性归因于应力能和量子尺寸效应。

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