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P-Type transparent conducting copper-strontium oxide thin films for optoelectronic devices

机译:用于光电器件的P型透明导电铜-氧化锶薄膜

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p-Type thin films of copper-strontium oxide (Cu-Sr-O) have been deposited by e-beam evaporation technique on microscopic glass substrates. A study of optical, electrical and structural properties was performed on the thin films, varying temperature of annealing. Amorphous Cu-Sr-O films were obtained at low temperature. Partially polycrystalline films were obtained at high temperature of 550 °C with transparency over 72% at wavelength from 600 to 700 nm in the visible region and 83% in the near infrared region (λ = 1800:2500 nm). The optical band gap was estimated to be ~3.5 eV. The Seebeck coefficient measurements showed that the as-deposited films represented n-type conduction and with annealing temperature these films converted to p-type. The electrical conductivity measurements at room temperature of annealed films at temperature of 550 °C represented the best value about 2 S/cm. The other optical parameters such as refractive index, extinction coefficient, dielectric constant and cutoff wavelength were studied as a function of annealing temperature.
机译:通过电子束蒸发技术在微玻璃基板上沉积了p型铜氧化锶(Cu-Sr-O)薄膜。在不同的退火温度下,对薄膜进行了光学,电学和结构性质的研究。在低温下获得非晶态的Cu-Sr-O薄膜。在550℃的高温下获得部分多晶膜,在可见光区域中600至700nm的波长下透明性超过72%,在近红外区域(λ= 1800:2500 nm)下透明性超过83%。光学带隙估计为〜3.5 eV。塞贝克系数测量结果表明,沉积后的薄膜表现出n型导电性,在退火温度下,这些薄膜转变为p型。在550°C的温度下,退火膜在室温下的电导率测量值代表约2 S / cm的最佳值。研究了其他光学参数,例如折射率,消光系数,介电常数和截止波长,它们是退火温度的函数。

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